Empowering India’s chip future, IIT Bhubaneswar gears up for the NaMo Semiconductor Lab, as MeitY approves a ₹49.5 million boost to R&D and skilled talent creation.
Ashwini Vaishnaw, Union Minister for Electronics and Information Technology, has approved the establishment of the NaMo Semiconductor Laboratory at the Indian Institute of Technology (IIT) Bhubaneswar. The project, funded under the Members of Parliament Local Area Development (MPLAD) Scheme, is estimated to cost approximately ₹49.5 million.
The lab will provide students with industry-grade training in semiconductor design and fabrication.
IIT Bhubaneswar, which already houses the Silicon Carbide Research and Innovation Centre (SiCRIC), will integrate the new lab into its existing cleanroom and R&D infrastructure. The NaMo Semiconductor Lab will be equipped with modern tools and software, with around ₹46 million allocated for equipment and ₹3.5 million for software.
According to the Ministry of Electronics and Information Technology (MeitY), it aims to strengthen India’s semiconductor ecosystem by nurturing a skilled talent pool for the country’s expanding chip manufacturing and packaging sectors.
This initiative aligns with the government’s Make in India and Design in India programmes, reinforcing efforts to boost domestic semiconductor production and reduce reliance on imports. It also supports India’s growing role in global chip design, with the country already accounting for 20% of the world’s chip design talent.
As per MeitY’s data, currently, students from 295 universities are using advanced Electronic Design Automation (EDA) tools, and 28 student-designed chips from 20 institutes have been successfully fabricated at SCL Mohali.
Meanwhile, Odisha has recently emerged as a promising semiconductor hub. Under the India Semiconductor Mission, the state has secured two major projects: one for an integrated SiC-based compound semiconductor facility and another for advanced 3D glass packaging.
MeitY is yet to announce by when the lab will be operational.
