- The agenda is to expand this Complex into a new High NA EUV Center
- This funding will encompass constructing a novel facility named NanoFab Reflection within the Albany NanoTech Complex
New York has recently shared a collaboration plan with IBM, Micron, and other industry players to invest $10 billion to expand the Albany NanoTech Complex.
The agenda is to expand this Complex into a new High NA EUV Center, which will be a next decade of semiconductor technology innovations.
North America’s publicly owned research and development Centre boasts a cutting-edge High Numerical Aperture Extreme Ultraviolet Lithography (High NA EUV) system. This state-of-the-art ASML machine is poised to introduce groundbreaking capabilities, potentially enabling the production of microchips at sizes smaller than 2 nanometers. The machine employs advanced laser technology, extending beyond the ultraviolet spectrum, to meticulously etch intricate circuitry pathways on an incredibly minute scale.
Within the Albany NanoTech Complex, a collaborative hub where IBM, the state of New York, and various industry and academic partners have been pioneering semiconductor innovation for over twenty years, the High NA EUV Center will emerge through a substantial investment of $10 billion.
This funding will encompass constructing a novel facility named NanoFab Reflection within the Albany NanoTech Complex and acquiring ASML’s state-of-the-art 5200 High NA EUV equipment. These investments are poised to foster the growth of an already thriving ecosystem and continue to push the boundaries of computing possibilities.
NanoFab Reflection, spanning an impressive 50,000 square feet of pristine clean-room space, holds the potential to usher in a significant wave of employment opportunities in the region. It also represents a promising future for semiconductor research and production within the United States. Groundbreaking for the new building at the complex is slated for 2024, marking a pivotal step toward the realization of this innovative endeavor.
